Experimental Studies of Electron Affinity and Work Function from Aluminium on Oxidized Diamond (100) and (111) Surfaces

Three different procedures are used to deposit aluminium onto O-terminated (100) and (111) boron-doped diamond, with the aim of producing a thermally stable surface low work function negative electron affinity. The methods 1) deposition > 20 nm film Al by high-vacuum evaporation followed HCl acid wash remove excess metallic Al, 2) <3 Å atomic layer deposition, 3) thin-film beam evaporation. structure, function, affinity investigated after annealing at temperatures 300, 600, 800 °C. Except for loss O upon first heating, + surfaces remain up values generally between 0.0 ?1.0 eV, is 4.5 ± 0.5 depending method, coverage, temperature. in broad agreement those predicted computer simulations (sub)monolayers on diamond surface.